Qualifying ultrathin alumina film prepared by plasma-enhance atomic layer deposition under low temperature operation
© 2017 Elsevier B.V. Preparation of ultrathin alumina (Al 2 O 3 ) films through Plasma-Enhanced Atomic Layer Deposition (PE-ALD) at low substrate temperature is discussed. The present work aims to investigate the physical mechanism of the PE-ALD deposition process and also the characteristics of the...
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| Main Authors: | , , , |
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| 格式: | 雜誌 |
| 出版: |
2017
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| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85029359113&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/40079 |
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| 機構: | Chiang Mai University |