Qualifying ultrathin alumina film prepared by plasma-enhance atomic layer deposition under low temperature operation
© 2017 Elsevier B.V. Preparation of ultrathin alumina (Al 2 O 3 ) films through Plasma-Enhanced Atomic Layer Deposition (PE-ALD) at low substrate temperature is discussed. The present work aims to investigate the physical mechanism of the PE-ALD deposition process and also the characteristics of the...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Journal |
| Published: |
2017
|
| Online Access: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85029359113&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/40079 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Chiang Mai University |