Applications of atomic layer deposition in solar cells

• المؤلفون الرئيسيون: Niu, Wenbin, Li, Xianglin, Karuturi, Siva Krishna, Fam, Derrick Wenhui, Fan, Hongjin, Shrestha, Santosh, Wong, Lydia Helena, Tok, Alfred Iing Yoong
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2016
• الموضوعات: bandstructure engineering; surface passivation
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/82762; http://hdl.handle.net/10220/40275

Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells...