Applications of atomic layer deposition in solar cells
Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells...
Saved in:
Main Authors: | Niu, Wenbin, Li, Xianglin, Karuturi, Siva Krishna, Fam, Derrick Wenhui, Fan, Hongjin, Shrestha, Santosh, Wong, Lydia Helena, Tok, Alfred Iing Yoong |
---|---|
Other Authors: | School of Materials Science & Engineering |
Format: | Article |
Language: | English |
Published: |
2016
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/82762 http://hdl.handle.net/10220/40275 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Electronic bandstructure and optical gain of lattice matched III-V dilute nitride bismide quantum wells for 1.55 μm optical communication systems
by: Fan, Wei Jun, et al.
Published: (2017) -
Numerical quantum modeling of field-effect-transistor with sub-10nm thin film semiconductor layer as active channel : physical limits and engineering challenges
by: LOW AIK SENG, TONY
Published: (2010) -
Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
by: Lin, F., et al.
Published: (2014) -
Mono-distributed single-walled carbon nanotube channel in field effect transistors (FETs) using electrostatic atomization deposition
by: Fam, Derrick Wen Hui, et al.
Published: (2011) -
Surface passivation of phosphorus-diffused n +-type emitters by plasma-assisted atomic-layer deposited Al 2O 3
by: Hoex, B., et al.
Published: (2014)