Applications of atomic layer deposition in solar cells

Applications of atomic layer deposition in solar cells

Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells...

Full description

Saved in:
Bibliographic Details
Main Authors: Niu, Wenbin, Li, Xianglin, Karuturi, Siva Krishna, Fam, Derrick Wenhui, Fan, Hongjin, Shrestha, Santosh, Wong, Lydia Helena, Tok, Alfred Iing Yoong
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2016
Subjects:
bandstructure engineering
surface passivation
Online Access:https://hdl.handle.net/10356/82762
http://hdl.handle.net/10220/40275
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
Description
Summary:Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.

Similar Items