Applications of atomic layer deposition in solar cells

• Main Authors: Niu, Wenbin, Li, Xianglin, Karuturi, Siva Krishna, Fam, Derrick Wenhui, Fan, Hongjin, Shrestha, Santosh, Wong, Lydia Helena, Tok, Alfred Iing Yoong
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2016
• Subjects: bandstructure engineering; surface passivation
• Online Access: https://hdl.handle.net/10356/82762; http://hdl.handle.net/10220/40275
• Institution: Nanyang Technological University

Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.