Integrated approach for low-temperature synthesis of high-quality silicon nitride films in PECVD using RF-UHF hybrid plasmas
© 2016 IOP Publishing Ltd. This study investigates low-temperature plasma nitriding of hydrogenated silicon (SiN x :H) film in radio frequency (RF) and RF-ultra-high frequency (UHF) hybrid plasmas. To study the optimized conditions for the deposition of SiN X :H film, this work adopts a systematic p...
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| Main Authors: | , , |
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| Format: | Journal |
| Published: |
2017
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| Online Access: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84957895200&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/42158 |
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| Institution: | Chiang Mai University |
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