Investigation of swift heavy I-ion irradiation effects on damage in silicon dioxide thin film
Silicon dioxide (SiO < inf > 2 < /inf > ) is a next-generation dielectric material for semiconductor processing. In particular, a thin film of amorphous-SiO < inf > 2 < /inf > (a-SiO < inf > 2 < /inf > ) on silicon wafers has many technological applications in mi...
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| Main Authors: | , , |
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| 格式: | 雜誌 |
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2018
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| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84937558982&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/45456 |
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| 機構: | Chiang Mai University |