Investigation of swift heavy I-ion irradiation effects on damage in silicon dioxide thin film

Silicon dioxide (SiO < inf > 2 < /inf > ) is a next-generation dielectric material for semiconductor processing. In particular, a thin film of amorphous-SiO < inf > 2 < /inf > (a-SiO < inf > 2 < /inf > ) on silicon wafers has many technological applications in mi...

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Bibliographic Details
Main Authors: S. Intarasiri, D. Bootkul, U. Tippawan
Format: Journal
Published: 2018
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84937558982&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/45456
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Institution: Chiang Mai University
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