Fabrication of 90° wall of {100} plane on (100) Si by NaOH solution via design of experiments
The experimental trials were conducted by design of experiments (DOE) technique to find an anisotropic wet etching condition that achieves 90° wall angle on silicon (100) orientation wafer. Three considered factors assigned to the DOE were NaOH concentration, solution temperature, and stirring speed...
Saved in:
Main Authors: | , |
---|---|
Format: | Book Series |
Published: |
2018
|
Online Access: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84898902835&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/45495 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Chiang Mai University |