Effect of plasma power on copper substrate used for synthesizing carbon nanotubes via Alcohol Catalytic Chemical Vapor Deposition (ACVD) technique
© 2016, Chiang Mai Journal of Science. All Rights Reserved. In this work, the authors attempted to modify a plasma treatment on copper substrate to increase its roughness surface by Low Pressure Plasma Treatment (LPPT). Plasma energy at the radio frequency of 13.56 MHz and the mixing gas between 30%...
محفوظ في:
المؤلفون الرئيسيون: | Sureewan Phunwaree, Wim Nhuapeng, Dheerawan Boonyawan, Wandee Thamjaree |
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التنسيق: | دورية |
منشور في: |
2018
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الموضوعات: | |
الوصول للمادة أونلاين: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84961840164&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/55264 |
الوسوم: |
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مواد مشابهة
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Effect of Plasma Power on Copper Substrate Used for Synthesizing Carbon Nanotubes via Alcohol Catalytic Chemical Vapor Deposition (ACVD) Technique
بواسطة: Sureewan Phunwaree, وآخرون
منشور في: (2019) -
Effect of plasma power on copper substrate used for synthesizing carbon nanotubes via Alcohol Catalytic Chemical Vapor Deposition (ACVD) technique
بواسطة: Phunwaree S., وآخرون
منشور في: (2017) -
Optimization of diamond-like carbon thin film on copper substrate for carbon nanotubes synthesis by ACVD technique
بواسطة: Chotika Suttichart, وآخرون
منشور في: (2018) -
Optimization of diamond-like carbon thin film on copper substrate for carbon nanotubes synthesis by ACVD technique
بواسطة: Chotika Suttichart, وآخرون
منشور في: (2018) -
Optimization of diamond-like carbon thin film on copper substrate for carbon nanotubes synthesis by ACVD technique
بواسطة: Suttichart C., وآخرون
منشور في: (2017)