Low partial pressure chemical vapor deposition of graphene on copper

• Main Authors: Sun, J., Lindvall, N., Cole, M.T., Angel, K.T.T., Wang, T., Teo, K.B.K., Chua, D.H.C., Liu, J., Yurgens, A.
• 其他作者: MATERIALS SCIENCE AND ENGINEERING
• 格式: Article
• 出版: 2014
• 主題: Chemical vapor deposition; graphene; low partial pressure; nanoelectronics; wet transfer
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/86500
• 機構: National University of Singapore

10.1109/TNANO.2011.2160729