Method to fabricate a double-polysilicon gate structure for a sub-quarter micron self-aligned-titanium silicide process

by PEY, KIN-LEONG, HO, CHAW SING, CHAN, LAP
Published 2012

Method to form uniform silicide features

by CHAN, LAP, HO, CHAW SING, LI, FONG YAU SAM, NG, HOU TEE
Published 2012

Pulsed laser salicidation for fabrication of ultra-thin silicides in sub-quarter micron devices

by HO, CHAW SING, LEE, YUAN PING, LAP, CHAN, LU, YONG FENG, KARUNASIRI, R.P.G.
Published 2012

Cmos gate architecture for integration of salicide process in sub 0.1. .muM devices

by HO, CHAW SING, KARUNASIRI, R. P. G., CHUA, SOO JIN, PEY, KIN LEONG, LEE, KONG HEAN
Published 2012