Distillation: Revisiting some rules of thumb

by Lek, C.M., Rangaiah, G.P., Hidajat, K.
Published 2014

Negative bias temperature instability on plasma-nitrided silicon dioxide film

by Ang, C.-H., Lek, C.-M., Tan, S.-S., Cho, B.-J., Chen, T., Lin, W., Zhen, J.-G.
Published 2014

Negative bias temperature instability on plasma-nitrided silicon dioxide film

by Ang, C.-H., Lek, C.-M., Tan, S.-S., Cho, B.-J., Chen, T., Lin, W., Zhen, J.-G.
Published 2014

Suppression of nitridation-induced interface traps and hole mobility degradation by nitrogen plasma nitridation

by Ang, C.H., Tan, S.S., Lek, C.M., Lin, W., Zheng, Z.J., Chen, T., Cho, B.J.
Published 2014

Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs

by Lek, C.M., Cho, B.J., Ang, C.H., Tan, S.S., Loh, W.Y., Zhen, J.Z., Lap, C.
Published 2014