Resolution performance of programmable proximity aperture MeV ion beam lithography system

بواسطة Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Nitipon Puttaraksa, Harry J. Whitlow
منشور في 2018

Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions

بواسطة Nitipon Puttaraksa, Rattanaporn Norarat, Mikko Laitinen, Timo Sajavaara, Somsorn Singkarat, Harry J. Whitlow
منشور في 2018

Programmable proximity aperture lithography with MeV ion beams

بواسطة Nitipon Puttaraksa, Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, Harry J. Whitlow
منشور في 2018

Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protons

بواسطة Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
منشور في 2018

Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protons

بواسطة Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
منشور في 2018

Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

بواسطة Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
منشور في 2018

Direct writing of channels for microfluidics in silica by MeV ion beam lithography

بواسطة Nitipon Puttaraksa, Mari Napari, Orapin Chienthavorn, Rattanaporn Norarat, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, Harry J. Whitlow
منشور في 2018