Resolution performance of programmable proximity aperture MeV ion beam lithography system

由 Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Nitipon Puttaraksa, Harry J. Whitlow
出版 2018

Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions

由 Nitipon Puttaraksa, Rattanaporn Norarat, Mikko Laitinen, Timo Sajavaara, Somsorn Singkarat, Harry J. Whitlow
出版 2018

Programmable proximity aperture lithography with MeV ion beams

由 Nitipon Puttaraksa, Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, Harry J. Whitlow
出版 2018

Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protons

由 Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
出版 2018

Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protons

由 Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
出版 2018

Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

由 Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
出版 2018

Direct writing of channels for microfluidics in silica by MeV ion beam lithography

由 Nitipon Puttaraksa, Mari Napari, Orapin Chienthavorn, Rattanaporn Norarat, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, Harry J. Whitlow
出版 2018