Analysis of correlated gate and drain random telegraph noise in post-soft breakdownTiN/HfLaO/SiOx nMOSFETs

بواسطة Liu, Wenhu, Padovani, Andrea, Larcher, Luca, Raghavan, Nagarajan, Pey, Kin Leong
منشور في 2014

Resilience of ultra-thin oxynitride films to percolative wear-out and reliability implications for high-κ stacks at low voltage stress

بواسطة Raghavan, Nagarajan, Padovani, Andrea, Li, Xiang, Bosman, Michel, Wu, Xing, Lip Lo, Vui, Larcher, Luca, Leong Pey, Kin
منشور في 2013