Fabrication and chracterization of single and multilayer tunnel dielectrics for advanced floating gate flash memory

by Ramzan, Mat Ayub
Published 2016

Polysilicon process development for floating gate memory devices

by Zarimawaty, Zailan, Ramzan, Mat Ayub, Mohd Rosydi, Zakaria
Published 2010

Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology

by Uda, Hashim, Ramzan, Mat Ayub, Nik Hazura, Nik Hamat
Published 2009

Wettability and surface roughness study on RIE treated aluminium deposited surface

by Retnasamy, Vithyacharan, Zaliman, Sauli, Dr., Uda, Hashim, Prof. Dr., Palianysamy, Moganraj, Aaron, Koay Terr Yeow, Ramzan, Mat Ayub
Published 2015

The Impacts of Platinum Diffusion to the Reverse Recovery Lifetime of a High Power Diode Devices

by C.M., Cheh, Mohd Khairuddin, Md Arshad, Ruslinda, Abdul Rahim, C., Ibau, Voon, Chun Hong, Ramzan, Mat Ayub, Uda, Hashim
Published 2020

Development of MEMS Manifold Absolute Pressure Sensor (MAPs) Prototype

by Zaliman, Sauli, Assoc. Prof., Hasnizah, Aris, Johari, Adnan, Assoc. Prof. Dr., Poopalan, Prabakaran, Assoc. Prof. Dr., Ramzan, Mat Ayub, Rizalafande, Che Ismail, Sohiful Anuar, Zainol Murad, Azuwir, Md. Nor, Abu Hassan, Abdullah, Mohd. Hatta, Musa, Razaidi, Hussin
Published 2010

Development of MEMS Manifold Absolute Pressure Sensor (MAPs) Prototype

by Zaliman, Sauli, Assoc. Prof., Hasnizah, Aris, Johari, Adnan, Assoc. Prof. Dr., Poopalan, Prabakaran, Assoc. Prof. Dr., Ramzan, Mat Ayub, Rizalafande, Che Ismail, Sohiful Anuar, Zainol Murad, Azuwir, Md. Nor, Abu Hassan, Abdullah, Mohd. Hatta, Musa, Razaidi, Hussin
Published 2010

The Effect of Process Parameters on Metal Step Coverage for Aluminum by Evaporation Technique

by Noraishah Azman
Published 2008

The study of the effect of MOS transistor scaling on the critical device parameters

by Zazurina Abd Rahman
Published 2008

Gate Oxide Integrity (GOI) Characterization For Deep Submicron CMOS Device

by Norain Mohd Saad
Published 2008

Polysilicon Process Development – The Effect Of PECVD Process Parameters On The Film Characteristics

by Mujahidun Mashuri
Published 2008