Optimal predictive control with constraints for the processing of semiconductor wafers on bake plates

by Ho, W.K., Tay, A., Schaper, C.D.
Published 2014

Optimal predictive control with constraints for the processing of semiconductor wafers on bake plates

by Ho, W.K., Tay, A., Schaper, C.D.
Published 2014

Resist film uniformity in the microlithography process

by Ho, W.K., Lee, L.L., Tay, A., Schaper, C.
Published 2014

Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturing

by Tay, A., Ho, W.K., Schaper, C.D., Lee, L.L.
Published 2014

On control of resist film uniformity in the microlithography process

by Ho, W.K., Tay, A., Lee, L.L., Schaper, C.D.
Published 2014

Integrated bake/chill module with in situ temperature measurement for photoresist processing

by Tay, A., Ho, W.-K., Loh, A.-P., Lim, K.-W., Tan, W.-W., Schaper, C.D.
Published 2014

Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array

by Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.K., Fuller, S.E.
Published 2014

Processing chemically amplified resists on advanced photomasks using a thermal array

by Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.-K., Fuller, S.E.
Published 2014