Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric

by Wang, X.P., Shen, C., Li, M.-F., Yu, H.Y., Sun, Y., Feng, Y.P., Lim, A., Sik, H.W., Chin, A., Yeo, Y.C., Lo, P., Kwong, D.L.
Published 2014