Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric

Digest of Technical Papers - Symposium on VLSI Technology

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Bibliographic Details
Main Authors: Wang, X.P., Shen, C., Li, M.-F., Yu, H.Y., Sun, Y., Feng, Y.P., Lim, A., Sik, H.W., Chin, A., Yeo, Y.C., Lo, P., Kwong, D.L.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83652
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Institution: National University of Singapore