A novel high-k gate dielectric HfLaO for next generation CMOS technology

• Main Authors: Li, M.-F., Wang, X.P., Yu, H.Y., Zhu, C.X., Chin, A., Du, A.Y., Shao, J., Lu, W., Shen, X.C., Liu, P., Hung, S., Lo, P., Kwong, D.L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83400
• Institution: National University of Singapore

10.1109/ICSICT.2006.306255