A novel high-k gate dielectric HfLaO for next generation CMOS technology
10.1109/ICSICT.2006.306255
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Main Authors: | Li, M.-F., Wang, X.P., Yu, H.Y., Zhu, C.X., Chin, A., Du, A.Y., Shao, J., Lu, W., Shen, X.C., Liu, P., Hung, S., Lo, P., Kwong, D.L. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83400 |
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Institution: | National University of Singapore |
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