A novel high-k gate dielectric HfLaO for next generation CMOS technology

A novel high-k gate dielectric HfLaO for next generation CMOS technology

10.1109/ICSICT.2006.306255

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Bibliographic Details
Main Authors: Li, M.-F., Wang, X.P., Yu, H.Y., Zhu, C.X., Chin, A., Du, A.Y., Shao, J., Lu, W., Shen, X.C., Liu, P., Hung, S., Lo, P., Kwong, D.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83400
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Institution: National University of Singapore
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Summary:10.1109/ICSICT.2006.306255

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