A novel high-k gate dielectric HfLaO for next generation CMOS technology

10.1109/ICSICT.2006.306255

Saved in:

Bibliographic Details
Main Authors:	Li, M.-F., Wang, X.P., Yu, H.Y., Zhu, C.X., Chin, A., Du, A.Y., Shao, J., Lu, W., Shen, X.C., Liu, P., Hung, S., Lo, P., Kwong, D.L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83400
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-83400
record_format	dspace
spelling	sg-nus-scholar.10635-834002015-01-06T22:29:56Z A novel high-k gate dielectric HfLaO for next generation CMOS technology Li, M.-F. Wang, X.P. Yu, H.Y. Zhu, C.X. Chin, A. Du, A.Y. Shao, J. Lu, W. Shen, X.C. Liu, P. Hung, S. Lo, P. Kwong, D.L. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ICSICT.2006.306255 ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings 372-375 2014-10-07T04:40:48Z 2014-10-07T04:40:48Z 2007 Conference Paper Li, M.-F.,Wang, X.P.,Yu, H.Y.,Zhu, C.X.,Chin, A.,Du, A.Y.,Shao, J.,Lu, W.,Shen, X.C.,Liu, P.,Hung, S.,Lo, P.,Kwong, D.L. (2007). A novel high-k gate dielectric HfLaO for next generation CMOS technology. ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings : 372-375. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ICSICT.2006.306255" target="_blank">https://doi.org/10.1109/ICSICT.2006.306255</a> 1424401615 http://scholarbank.nus.edu.sg/handle/10635/83400 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/ICSICT.2006.306255
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Li, M.-F. Wang, X.P. Yu, H.Y. Zhu, C.X. Chin, A. Du, A.Y. Shao, J. Lu, W. Shen, X.C. Liu, P. Hung, S. Lo, P. Kwong, D.L.
format	Conference or Workshop Item
author	Li, M.-F. Wang, X.P. Yu, H.Y. Zhu, C.X. Chin, A. Du, A.Y. Shao, J. Lu, W. Shen, X.C. Liu, P. Hung, S. Lo, P. Kwong, D.L.
spellingShingle	Li, M.-F. Wang, X.P. Yu, H.Y. Zhu, C.X. Chin, A. Du, A.Y. Shao, J. Lu, W. Shen, X.C. Liu, P. Hung, S. Lo, P. Kwong, D.L. A novel high-k gate dielectric HfLaO for next generation CMOS technology
author_sort	Li, M.-F.
title	A novel high-k gate dielectric HfLaO for next generation CMOS technology
title_short	A novel high-k gate dielectric HfLaO for next generation CMOS technology
title_full	A novel high-k gate dielectric HfLaO for next generation CMOS technology
title_fullStr	A novel high-k gate dielectric HfLaO for next generation CMOS technology
title_full_unstemmed	A novel high-k gate dielectric HfLaO for next generation CMOS technology
title_sort	novel high-k gate dielectric hflao for next generation cmos technology
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83400
_version_	1681089428903165952

A novel high-k gate dielectric HfLaO for next generation CMOS technology

Similar Items