Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric

Digest of Technical Papers - Symposium on VLSI Technology

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Bibliographic Details
Main Authors:	Wang, X.P., Shen, C., Li, M.-F., Yu, H.Y., Sun, Y., Feng, Y.P., Lim, A., Sik, H.W., Chin, A., Yeo, Y.C., Lo, P., Kwong, D.L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83652
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83652
record_format	dspace
spelling	sg-nus-scholar.10635-836522024-11-10T23:57:28Z Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric Wang, X.P. Shen, C. Li, M.-F. Yu, H.Y. Sun, Y. Feng, Y.P. Lim, A. Sik, H.W. Chin, A. Yeo, Y.C. Lo, P. Kwong, D.L. ELECTRICAL & COMPUTER ENGINEERING PHYSICS Digest of Technical Papers - Symposium on VLSI Technology 9-10 DTPTE 2014-10-07T04:43:39Z 2014-10-07T04:43:39Z 2006 Conference Paper Wang, X.P.,Shen, C.,Li, M.-F.,Yu, H.Y.,Sun, Y.,Feng, Y.P.,Lim, A.,Sik, H.W.,Chin, A.,Yeo, Y.C.,Lo, P.,Kwong, D.L. (2006). Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric. Digest of Technical Papers - Symposium on VLSI Technology : 9-10. ScholarBank@NUS Repository. 1424400058 07431562 http://scholarbank.nus.edu.sg/handle/10635/83652 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	Digest of Technical Papers - Symposium on VLSI Technology
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wang, X.P. Shen, C. Li, M.-F. Yu, H.Y. Sun, Y. Feng, Y.P. Lim, A. Sik, H.W. Chin, A. Yeo, Y.C. Lo, P. Kwong, D.L.
format	Conference or Workshop Item
author	Wang, X.P. Shen, C. Li, M.-F. Yu, H.Y. Sun, Y. Feng, Y.P. Lim, A. Sik, H.W. Chin, A. Yeo, Y.C. Lo, P. Kwong, D.L.
spellingShingle	Wang, X.P. Shen, C. Li, M.-F. Yu, H.Y. Sun, Y. Feng, Y.P. Lim, A. Sik, H.W. Chin, A. Yeo, Y.C. Lo, P. Kwong, D.L. Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric
author_sort	Wang, X.P.
title	Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric
title_short	Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric
title_full	Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric
title_fullStr	Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric
title_full_unstemmed	Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric
title_sort	dual metal gates with band-edge work functions on novel hflao high- κ gate dielectric
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83652
_version_	1821228331107876864

Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric

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