Dual metal gates with band-edge work functions on novel HfLaO high- κ gate dielectric

• Main Authors: Wang, X.P., Shen, C., Li, M.-F., Yu, H.Y., Sun, Y., Feng, Y.P., Lim, A., Sik, H.W., Chin, A., Yeo, Y.C., Lo, P., Kwong, D.L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83652
• Institution: National University of Singapore

Digest of Technical Papers - Symposium on VLSI Technology