STUDI PENGARUH TEMPEI ATUR PENUMBUHAN TERHADAP KUALITAS FILM TIPIS GAN DITUMBUHKAN DENGAN TEKNIK PULSED LASER DEPOSITION

GaN thin film has been grown on sapphire (0001) substrate using a pulsed laser deposition technique. The N2 gass with 100 sccm flow rate, is used to keep the thin film stoichiometric. The growth temperature was varied from 650°C, 680°C to 700°C. GaN film was analized by mean of Profilometer Dekta...

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Bibliographic Details
Main Author: WIDIYANDARI , HENDRI
Format: Theses
Language:Indonesia
Online Access:https://digilib.itb.ac.id/gdl/view/1838
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Institution: Institut Teknologi Bandung
Language: Indonesia
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