THE INFLUENCE OF IMPURITY ON ALUMINIUM ZINC OXIDE (AZO) THIN FILMS GROWN BY WITH DC-SPUTTERING METHOD
Aluminum Zinc Oxide (AZO) with 2 wt.%, 3 wt.%, and 5 wt.% composition, which have been grinded, heated, pressed, and re-heated, were grown on glass substrates with DC-sputtering deposition method. AZO thin films then were characterized by X-Raydiffraction (XRD), Scanning Electron Microscopy (SEM), a...
Saved in:
| Main Author: | |
|---|---|
| Format: | Final Project |
| Language: | Indonesia |
| Online Access: | https://digilib.itb.ac.id/gdl/view/20414 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |
| Summary: | Aluminum Zinc Oxide (AZO) with 2 wt.%, 3 wt.%, and 5 wt.% composition, which have been grinded, heated, pressed, and re-heated, were grown on glass substrates with DC-sputtering deposition method. AZO thin films then were characterized by X-Raydiffraction (XRD), Scanning Electron Microscopy (SEM), andSpectrophotometer UV-visible. The results show the profile of the AZO thin film such as crystalline size, particle size, transmittance, and also the thin film thickness. <br />
<br />
<br />
... |
|---|