MOLECULAR DYNAMICS SIMULATION STUDY OF METAL CATALYST FILM GROWTH PROCESS BY EVAPORATION METHOD AND ANNEALING FOR GRAPHENE DEPOSITION CATALYST APPLICATION
Molecular dynamics simulation have been applied to study the mechanism of copper film growth on silicon substrate and annealing process. Interaction potential Meam is used to describe the interaction of Cu-Cu, Si-Si and Cu-Si. In particular, deposition rate, annealing temperature and diffusion time...
Saved in:
| Main Author: | |
|---|---|
| Format: | Theses |
| Language: | Indonesia |
| Online Access: | https://digilib.itb.ac.id/gdl/view/24001 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |