FABRIKASI SOI DENGAN METODA ELTRAN

<b>Abstract:</b><p align="justify"> <br /> <br /> <br /> Fabrication of SOI wafer was done using ELTRAN method with processes as follows: porous Si synthesis, epitaxial growth, oxidation, wafer bonding, grinding and etching. The key processes are ep...

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Main Author: Sulardi
Format: Theses
Language:Indonesia
Online Access:https://digilib.itb.ac.id/gdl/view/4740
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Institution: Institut Teknologi Bandung
Language: Indonesia
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spelling id-itb.:47402006-03-15T11:41:07ZFABRIKASI SOI DENGAN METODA ELTRAN Sulardi Indonesia Theses INSTITUT TEKNOLOGI BANDUNG https://digilib.itb.ac.id/gdl/view/4740 <b>Abstract:</b><p align="justify"> <br /> <br /> <br /> Fabrication of SOI wafer was done using ELTRAN method with processes as follows: porous Si synthesis, epitaxial growth, oxidation, wafer bonding, grinding and etching. The key processes are epitaxial growth over porous silicon.<p align="justify"> <br /> <br /> <br /> The XRD and SEM characterization to the SOI wafer shows that porous Si with pore diameter of 2 - 10 pm, synthesis time of 30 minutes and perpendicular expansion of 0.549 %, has a characteristic of monocrystalline. Since the crystal quality of epitaxial layer over the porous silicon is as good as that of crystalline silicon. The indicator is market up by the X-Ray Diffraction (cps) that reaches 329628.875000 at the angle (28) of 69.380592.<p align="justify"> <br /> <br /> text
institution Institut Teknologi Bandung
building Institut Teknologi Bandung Library
continent Asia
country Indonesia
Indonesia
content_provider Institut Teknologi Bandung
collection Digital ITB
language Indonesia
description <b>Abstract:</b><p align="justify"> <br /> <br /> <br /> Fabrication of SOI wafer was done using ELTRAN method with processes as follows: porous Si synthesis, epitaxial growth, oxidation, wafer bonding, grinding and etching. The key processes are epitaxial growth over porous silicon.<p align="justify"> <br /> <br /> <br /> The XRD and SEM characterization to the SOI wafer shows that porous Si with pore diameter of 2 - 10 pm, synthesis time of 30 minutes and perpendicular expansion of 0.549 %, has a characteristic of monocrystalline. Since the crystal quality of epitaxial layer over the porous silicon is as good as that of crystalline silicon. The indicator is market up by the X-Ray Diffraction (cps) that reaches 329628.875000 at the angle (28) of 69.380592.<p align="justify"> <br /> <br />
format Theses
author Sulardi
spellingShingle Sulardi
FABRIKASI SOI DENGAN METODA ELTRAN
author_facet Sulardi
author_sort Sulardi
title FABRIKASI SOI DENGAN METODA ELTRAN
title_short FABRIKASI SOI DENGAN METODA ELTRAN
title_full FABRIKASI SOI DENGAN METODA ELTRAN
title_fullStr FABRIKASI SOI DENGAN METODA ELTRAN
title_full_unstemmed FABRIKASI SOI DENGAN METODA ELTRAN
title_sort fabrikasi soi dengan metoda eltran
url https://digilib.itb.ac.id/gdl/view/4740
_version_ 1820663482315440128