ANALYSIS OF BALLISTIC ELECTRON TRANSPORT IN DOUBLE-GATE MOSFET USING THE NON-EQUILIBRIUM GREENâS FUNCTION METHOD
This study analyzes ballistic electron transport in Double-Gate (DG) Metal-OxideSemiconductor Field Effect Transistor (MOSFET) using the Non-Equilibrium Green's Function (NEGF) method combined with the Newton-Raphson technique to solve the Schrödinger and Poisson equations. The research aims...
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Format: | Theses |
Language: | Indonesia |
Online Access: | https://digilib.itb.ac.id/gdl/view/86874 |
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Institution: | Institut Teknologi Bandung |
Language: | Indonesia |
Summary: | This study analyzes ballistic electron transport in Double-Gate (DG) Metal-OxideSemiconductor Field Effect Transistor (MOSFET) using the Non-Equilibrium Green's
Function (NEGF) method combined with the Newton-Raphson technique to solve the
Schrödinger and Poisson equations. The research aims to understand the influence of external
voltage on the distribution of electrostatic potential, subband energy, and electron density, as
well as its impact on channel conductivity in nanoscale transistors. Simulation results reveal
that the electrostatic potential distribution plays a crucial role in controlling electron
movement. A gradual increase in gate-source (????????????) and drain-source (????????????) voltages lowers the
potential barrier near the source and drain, enabling electron accumulation in the channel and
enhancing conductivity, which subsequently generates current. Subband energy analysis
reveals that the first subband dominates electron flow, while higher-energy subbands are only
occupied under larger external bias conditions. The electron density distribution indicates a
high concentration of electrons in the source and drain regions, while the channel approaches
zero at higher-energy subbands. Under low voltage conditions, the electron distribution is
dominated by the first subband, whereas the contributions of the second and third subbands
become significant at higher gate voltages.
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