Application of Bond-valence Modelling Method for Illustration of Point Defects in Semiconductors

Point defects in semiconductors cause many considerable behaviours of these materials. This article introduces a procedure for modelling of point defects using a structural approach often referred to as a bond-valence method. This method minimalizes the computation cost and facilitates a contruction...

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Bibliographic Details
Main Author: Hoang, Nam Nhat
Format: Article
Language:English
Published: H. : ĐHQGHN 2018
Subjects:
Online Access:http://repository.vnu.edu.vn/handle/VNU_123/62915
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Institution: Vietnam National University, Hanoi
Language: English
Description
Summary:Point defects in semiconductors cause many considerable behaviours of these materials. This article introduces a procedure for modelling of point defects using a structural approach often referred to as a bond-valence method. This method minimalizes the computation cost and facilitates a contruction of complex 3D images illustrating the point defects, including the charge distribution map at contact interfaces. This method also provides a convenient way to estimate the carrier density and defect locations, it visualizes a dynamics of valence relocation under thermal fluctuation