Pulsed-laser deposited TiN2 coatings on silicon substrate

• المؤلفون الرئيسيون: Ortile, Alva Lolit, Law, Kelwin, Yu Eng Hong, Jacqueline, Santos, Gil Nonato C., Quiroga, Reuben V., Garcia, Wilson O.
• التنسيق: text
• منشور في: Animo Repository 2002
• الموضوعات: Titanium nitride; Pulsed laser deposition; Silicon; Coatings; Physics
• الوصول للمادة أونلاين: https://animorepository.dlsu.edu.ph/faculty_research/12788

In this study, the pulsed laser deposition technique was used to deposit TiN2 coatings on silicon. Forty samples were studied. From the results of the SEM and EDX, the optimum parameters for deposition is deposition for two hours with vacuum pressure of 5x10-4 Torr, nitrogen gas flow between 2 to 10...