Pulsed-laser deposited TiN2 coatings on silicon substrate

• Main Authors: Ortile, Alva Lolit, Law, Kelwin, Yu Eng Hong, Jacqueline, Santos, Gil Nonato C., Quiroga, Reuben V., Garcia, Wilson O.
• Format: text
• Published: Animo Repository 2002
• Subjects: Titanium nitride; Pulsed laser deposition; Silicon; Coatings; Physics
• Online Access: https://animorepository.dlsu.edu.ph/faculty_research/12788
• Institution: De La Salle University

In this study, the pulsed laser deposition technique was used to deposit TiN2 coatings on silicon. Forty samples were studied. From the results of the SEM and EDX, the optimum parameters for deposition is deposition for two hours with vacuum pressure of 5x10-4 Torr, nitrogen gas flow between 2 to 10...