Reactive ion etching of NiFe thin films from first-principles study: A case study

Reactive ion etching of NiFe thin films from first-principles study: A case study

We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface...

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書目詳細資料
Main Authors:	Watanabe, Susumu, Diño, Wilson Agerico, Nakanishi, Hiroshi, Kasai, Hideaki, Akinaga, Hiroyuki
格式:	text
出版:	Animo Repository 2005
主題:	Magnetic materials Thin films
在線閱讀:	https://animorepository.dlsu.edu.ph/faculty_research/3106
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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