Low temperature direct wafer bonding of GaAs to Si via plasma activation

The present work seeks to demonstrate the elegance and simplicity of monolithic integration via plasma-activated direct wafer bonding. Two-inch gallium arsenide and silicon wafers were directly bonded through argon plasma activation. The highest specific bond energy was found for plasma conditions o...

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Bibliographic Details
Main Authors: Xu, D. W., Fitzgerald, Eugene A., Yeo, Chiew Yong, Yoon, Soon Fatt
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2014
Subjects:
Online Access:https://hdl.handle.net/10356/100308
http://hdl.handle.net/10220/18646
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Institution: Nanyang Technological University
Language: English