A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures

Historically, there has been a controversy regarding whether the leakage current versus voltage (I-V) relationship is governed by the Schottky mechanism or by the Poole-Frenkel (P-F) mechanism for several decades. For the P-F mechanism, the I-V characteristics is expected to be symmetrical. In this...

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Main Author: Lau, Wai Shing.
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2013
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Online Access:https://hdl.handle.net/10356/100632
http://hdl.handle.net/10220/11035
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1006322020-03-07T14:00:30Z A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures Lau, Wai Shing. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering Historically, there has been a controversy regarding whether the leakage current versus voltage (I-V) relationship is governed by the Schottky mechanism or by the Poole-Frenkel (P-F) mechanism for several decades. For the P-F mechanism, the I-V characteristics is expected to be symmetrical. In this paper, the author points out that there is an extra mechanism for symmetrical I-V characteristics. Published version 2013-07-09T02:26:53Z 2019-12-06T20:25:41Z 2013-07-09T02:26:53Z 2019-12-06T20:25:41Z 2012 2012 Journal Article Lau, W. S. (2012). A New Mechanism of Symmetry of Current-Voltage Characteristics for High-k Dielectric Capacitor Structures. ECS Transactions,45(3), 151-158. 1938-6737 https://hdl.handle.net/10356/100632 http://hdl.handle.net/10220/11035 10.1149/1.3700881 en ECS transactions © 2012 The Electrochemical Society. This paper was published in ECS Transactions and is made available as an electronic reprint (preprint) with permission of The Electrochemical Society. The paper can be found at the following official DOI: [http://dx.doi.org/10.1149/1.3700881]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Lau, Wai Shing.
A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
description Historically, there has been a controversy regarding whether the leakage current versus voltage (I-V) relationship is governed by the Schottky mechanism or by the Poole-Frenkel (P-F) mechanism for several decades. For the P-F mechanism, the I-V characteristics is expected to be symmetrical. In this paper, the author points out that there is an extra mechanism for symmetrical I-V characteristics.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Lau, Wai Shing.
format Article
author Lau, Wai Shing.
author_sort Lau, Wai Shing.
title A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
title_short A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
title_full A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
title_fullStr A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
title_full_unstemmed A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
title_sort new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
publishDate 2013
url https://hdl.handle.net/10356/100632
http://hdl.handle.net/10220/11035
_version_ 1681035787715477504