A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures
Historically, there has been a controversy regarding whether the leakage current versus voltage (I-V) relationship is governed by the Schottky mechanism or by the Poole-Frenkel (P-F) mechanism for several decades. For the P-F mechanism, the I-V characteristics is expected to be symmetrical. In this...
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sg-ntu-dr.10356-1006322020-03-07T14:00:30Z A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures Lau, Wai Shing. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering Historically, there has been a controversy regarding whether the leakage current versus voltage (I-V) relationship is governed by the Schottky mechanism or by the Poole-Frenkel (P-F) mechanism for several decades. For the P-F mechanism, the I-V characteristics is expected to be symmetrical. In this paper, the author points out that there is an extra mechanism for symmetrical I-V characteristics. Published version 2013-07-09T02:26:53Z 2019-12-06T20:25:41Z 2013-07-09T02:26:53Z 2019-12-06T20:25:41Z 2012 2012 Journal Article Lau, W. S. (2012). A New Mechanism of Symmetry of Current-Voltage Characteristics for High-k Dielectric Capacitor Structures. ECS Transactions,45(3), 151-158. 1938-6737 https://hdl.handle.net/10356/100632 http://hdl.handle.net/10220/11035 10.1149/1.3700881 en ECS transactions © 2012 The Electrochemical Society. This paper was published in ECS Transactions and is made available as an electronic reprint (preprint) with permission of The Electrochemical Society. The paper can be found at the following official DOI: [http://dx.doi.org/10.1149/1.3700881]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. application/pdf |
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DRNTU::Engineering::Electrical and electronic engineering Lau, Wai Shing. A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures |
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Historically, there has been a controversy regarding whether the leakage current versus voltage (I-V) relationship is governed by the Schottky mechanism or by the Poole-Frenkel (P-F) mechanism for several decades. For the P-F mechanism, the I-V characteristics is expected to be symmetrical. In this paper, the author points out that there is an extra mechanism for symmetrical I-V characteristics. |
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School of Electrical and Electronic Engineering |
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School of Electrical and Electronic Engineering Lau, Wai Shing. |
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Article |
author |
Lau, Wai Shing. |
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Lau, Wai Shing. |
title |
A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures |
title_short |
A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures |
title_full |
A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures |
title_fullStr |
A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures |
title_full_unstemmed |
A new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures |
title_sort |
new mechanism of symmetry of current-voltage characteristics for high-k dielectric capacitor structures |
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2013 |
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https://hdl.handle.net/10356/100632 http://hdl.handle.net/10220/11035 |
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1681035787715477504 |