Characterisation of amorphous carbon films deposited using ECR-CVD

Characterisation of amorphous carbon films deposited using ECR-CVD

Hydrogenated diamond-like carbon (DLC) films have received a considerable amount of interest recently due to their unique characteristics such as chemical stability, mechanical hardness and high optical transparency. Among different deposition methods, the electron cyclotron resonance chemical vapou...

Full description

Saved in:
Bibliographic Details
Main Author: Wu, Yangsheng.
Other Authors: Yoon, Soon Fatt
Format: Theses and Dissertations
Language:English
Published: 2008
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials
Online Access:http://hdl.handle.net/10356/13268
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
id sg-ntu-dr.10356-13268
record_format dspace
spelling sg-ntu-dr.10356-132682023-07-04T15:30:05Z Characterisation of amorphous carbon films deposited using ECR-CVD Wu, Yangsheng. Yoon, Soon Fatt School of Electrical and Electronic Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials Hydrogenated diamond-like carbon (DLC) films have received a considerable amount of interest recently due to their unique characteristics such as chemical stability, mechanical hardness and high optical transparency. Among different deposition methods, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been increasingly used for the growth of DLC films due to its capable of producing a highly excited plasma with greater efficiency in the breaking of the C-H bonds in the reactant gas mixture. Master of Engineering 2008-10-20T07:22:22Z 2008-10-20T07:22:22Z 1999 1999 Thesis http://hdl.handle.net/10356/13268 en 98 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Materials::Microelectronics and semiconductor materials
spellingShingle DRNTU::Engineering::Materials::Microelectronics and semiconductor materials
Wu, Yangsheng.
Characterisation of amorphous carbon films deposited using ECR-CVD
description Hydrogenated diamond-like carbon (DLC) films have received a considerable amount of interest recently due to their unique characteristics such as chemical stability, mechanical hardness and high optical transparency. Among different deposition methods, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been increasingly used for the growth of DLC films due to its capable of producing a highly excited plasma with greater efficiency in the breaking of the C-H bonds in the reactant gas mixture.
author2 Yoon, Soon Fatt
author_facet Yoon, Soon Fatt
Wu, Yangsheng.
format Theses and Dissertations
author Wu, Yangsheng.
author_sort Wu, Yangsheng.
title Characterisation of amorphous carbon films deposited using ECR-CVD
title_short Characterisation of amorphous carbon films deposited using ECR-CVD
title_full Characterisation of amorphous carbon films deposited using ECR-CVD
title_fullStr Characterisation of amorphous carbon films deposited using ECR-CVD
title_full_unstemmed Characterisation of amorphous carbon films deposited using ECR-CVD
title_sort characterisation of amorphous carbon films deposited using ecr-cvd
publishDate 2008
url http://hdl.handle.net/10356/13268
_version_ 1772826132132921344

Similar Items