Direct simulation Monte Carlo method of deposition processes

• Main Author: Tan, Chee Hong.
• Other Authors: Zhao, Yong
• Format: Theses and Dissertations
• Language: English
• Published: 2008
• Subjects: DRNTU::Engineering::Computer science and engineering::Computing methodologies::Simulation and modeling; DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: http://hdl.handle.net/10356/13523
• Institution: Nanyang Technological University

Modifications had been done on the basic DSMC2.fortran program developed by G. A. Bird to approximate the initial deposition profile characteristic of a physical vapor deposition process, whereby little or no surface chemical reaction occurs. In this report, initial deposition growth of PVD Aluminum...