Pulsed laser annealed silicides formation for advanced MOS applications

Pulsed laser annealed silicides formation for advanced MOS applications

The aim of this work is to investigate the laser-induced silicide and germanosilicide formation in detail. Three main aspects, which affect the laser-induced silicide or germanosilicide formation, will be evaluated. First of them is the effect of laser fluence and number of laser pulses. These direc...

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Bibliographic Details
Main Author: Yudi, Setiawan.
Other Authors: Lee Pooi See
Format: Theses and Dissertations
Language:English
Published: 2009
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:http://hdl.handle.net/10356/14847
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Institution: Nanyang Technological University
Language: English

Internet

http://hdl.handle.net/10356/14847

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