Oxide-defects driven study on reliability and synaptic response characterization of logic devices

The thesis discusses our studies on the key characterization issues and physical mechanisms of channel-hot carrier (CHC) stressing in reliability and variability in nanoscale MOS devices. This provides physical understanding of HCD in reliability qualification and helps reliability-aware circuits de...

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Main Author: Ju, Xin
Other Authors: Ang Diing Shenp
Format: Thesis-Doctor of Philosophy
Language:English
Published: Nanyang Technological University 2021
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Online Access:https://hdl.handle.net/10356/152681
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1526812023-07-04T16:47:58Z Oxide-defects driven study on reliability and synaptic response characterization of logic devices Ju, Xin Ang Diing Shenp School of Electrical and Electronic Engineering EDSAng@ntu.edu.sg Engineering::Electrical and electronic engineering::Microelectronics The thesis discusses our studies on the key characterization issues and physical mechanisms of channel-hot carrier (CHC) stressing in reliability and variability in nanoscale MOS devices. This provides physical understanding of HCD in reliability qualification and helps reliability-aware circuits design in nanoscale CMOS technology. In addition, successful demonstration of synaptic characteristics with a logic transistor by modulating charge capture/emission kinetics in gate oxide shows the potential of realizing neuromorphic systems capable of encoding and processing complex spatiotemporal information. Doctor of Philosophy 2021-09-13T06:52:45Z 2021-09-13T06:52:45Z 2021 Thesis-Doctor of Philosophy Ju, X. (2021). Oxide-defects driven study on reliability and synaptic response characterization of logic devices. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/152681 https://hdl.handle.net/10356/152681 10.32657/10356/152681 en This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License (CC BY-NC 4.0). application/pdf Nanyang Technological University
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle Engineering::Electrical and electronic engineering::Microelectronics
Ju, Xin
Oxide-defects driven study on reliability and synaptic response characterization of logic devices
description The thesis discusses our studies on the key characterization issues and physical mechanisms of channel-hot carrier (CHC) stressing in reliability and variability in nanoscale MOS devices. This provides physical understanding of HCD in reliability qualification and helps reliability-aware circuits design in nanoscale CMOS technology. In addition, successful demonstration of synaptic characteristics with a logic transistor by modulating charge capture/emission kinetics in gate oxide shows the potential of realizing neuromorphic systems capable of encoding and processing complex spatiotemporal information.
author2 Ang Diing Shenp
author_facet Ang Diing Shenp
Ju, Xin
format Thesis-Doctor of Philosophy
author Ju, Xin
author_sort Ju, Xin
title Oxide-defects driven study on reliability and synaptic response characterization of logic devices
title_short Oxide-defects driven study on reliability and synaptic response characterization of logic devices
title_full Oxide-defects driven study on reliability and synaptic response characterization of logic devices
title_fullStr Oxide-defects driven study on reliability and synaptic response characterization of logic devices
title_full_unstemmed Oxide-defects driven study on reliability and synaptic response characterization of logic devices
title_sort oxide-defects driven study on reliability and synaptic response characterization of logic devices
publisher Nanyang Technological University
publishDate 2021
url https://hdl.handle.net/10356/152681
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