Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Rhodium (Rh) and palladium (Pd) thin films have been fabricated using an atomic layer deposition (ALD) process using Rh(acac)3 and Pd(hfac)2 as the respective precursors and using short-pulse low-concentration ozone as the co-reactant. This method of fabrication does away with the need for combustib...

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Bibliographic Details
Main Authors: Zou, Yiming, Cheng, Chunyu, Guo, Yuanyuan, Ong, Amanda Jiamin, Goei, Ronn, Li, Shuzhou, Tok, Alfred Iing Yoong
Other Authors: School of Materials Science and Engineering
Format: Article
Language:English
Published: 2022
Subjects:
Engineering::Materials
Hydrogen Storage
Oxide
Online Access:https://hdl.handle.net/10356/160044
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Institution: Nanyang Technological University
Language: English

Internet

https://hdl.handle.net/10356/160044

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