Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Rhodium (Rh) and palladium (Pd) thin films have been fabricated using an atomic layer deposition (ALD) process using Rh(acac)3 and Pd(hfac)2 as the respective precursors and using short-pulse low-concentration ozone as the co-reactant. This method of fabrication does away with the need for combustib...

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書目詳細資料
Main Authors:	Zou, Yiming, Cheng, Chunyu, Guo, Yuanyuan, Ong, Amanda Jiamin, Goei, Ronn, Li, Shuzhou, Tok, Alfred Iing Yoong
其他作者:	School of Materials Science and Engineering
格式:	Article
語言:	English
出版:	2022
主題:	Engineering::Materials Hydrogen Storage Oxide
在線閱讀:	https://hdl.handle.net/10356/160044
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	Nanyang Technological University
語言:	English

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