Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

• Main Authors: Zou, Yiming, Cheng, Chunyu, Guo, Yuanyuan, Ong, Amanda Jiamin, Goei, Ronn, Li, Shuzhou, Tok, Alfred Iing Yoong
• Other Authors: School of Materials Science and Engineering
• Format: Article
• Language: English
• Published: 2022
• Subjects: Engineering::Materials; Hydrogen Storage; Oxide
• Online Access: https://hdl.handle.net/10356/160044
• Institution: Nanyang Technological University

Rhodium (Rh) and palladium (Pd) thin films have been fabricated using an atomic layer deposition (ALD) process using Rh(acac)3 and Pd(hfac)2 as the respective precursors and using short-pulse low-concentration ozone as the co-reactant. This method of fabrication does away with the need for combustib...