Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

• المؤلفون الرئيسيون: Zou, Yiming, Cheng, Chunyu, Guo, Yuanyuan, Ong, Amanda Jiamin, Goei, Ronn, Li, Shuzhou, Tok, Alfred Iing Yoong
• مؤلفون آخرون: School of Materials Science and Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2022
• الموضوعات: Engineering::Materials; Hydrogen Storage; Oxide
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/160044

Rhodium (Rh) and palladium (Pd) thin films have been fabricated using an atomic layer deposition (ALD) process using Rh(acac)3 and Pd(hfac)2 as the respective precursors and using short-pulse low-concentration ozone as the co-reactant. This method of fabrication does away with the need for combustib...