Some thermal mismatch problems in electronic devices

Electronic devices consist of multiple layers of different materials having different coefficient of thermal expansion (CTE). During processing, the high operating temperature induces thermal stress on the interface of the different layer as well as thermally-induced bending of the structure due to...

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Main Author: Fazrul Fazmi
Other Authors: Xiao Zhongmin
Format: Final Year Project
Language:English
Published: 2009
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Online Access:http://hdl.handle.net/10356/16614
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-166142023-03-04T18:31:12Z Some thermal mismatch problems in electronic devices Fazrul Fazmi Xiao Zhongmin School of Mechanical and Aerospace Engineering DRNTU::Engineering::Mechanical engineering::Mechatronics Electronic devices consist of multiple layers of different materials having different coefficient of thermal expansion (CTE). During processing, the high operating temperature induces thermal stress on the interface of the different layer as well as thermally-induced bending of the structure due to the mismatch in CTE of the materials. If the magnitude of stress is high enough, failure of the structure may occur. Hence, this project aimed to investigate the effects of temperature changes on thermal stress in these devices. Three cases were studied in this project: (1) Investigation of thermal stress during thermal oxidation of silicon, (2) Investigation of thermally-induced crack propagation during die attach and (3) Popcorn cracking in plastic IC devices. Parametric analyses of the factors that may affect the reliability of the devices during these processing operations were performed using the commercial Finite Element software, Ansys. Results indicated that factors that can increase the magnitude of thermal stress during thermal oxidation include higher CTE mismatch and higher substrate thickness and modulus. In addition, a shorter crack length and lower CTE mismatch are some of the conditions that can lower the likelihood of crack propagation in a silicon die during the die attach operation. Finally, it was found out that a higher vapor pressure loading and crack length can increase the probability of popcorn cracking. The results in this study have indicated the importance of processing temperature, device geometry and material properties on the effect of thermal stress and crack propagation during processing. Hence, it is paramount for manufacturers to take these factors into consideration in order to improve the reliability of these devices. Bachelor of Engineering (Mechanical Engineering) 2009-05-27T07:02:26Z 2009-05-27T07:02:26Z 2009 2009 Final Year Project (FYP) http://hdl.handle.net/10356/16614 en Nanyang Technological University 100 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Mechanical engineering::Mechatronics
spellingShingle DRNTU::Engineering::Mechanical engineering::Mechatronics
Fazrul Fazmi
Some thermal mismatch problems in electronic devices
description Electronic devices consist of multiple layers of different materials having different coefficient of thermal expansion (CTE). During processing, the high operating temperature induces thermal stress on the interface of the different layer as well as thermally-induced bending of the structure due to the mismatch in CTE of the materials. If the magnitude of stress is high enough, failure of the structure may occur. Hence, this project aimed to investigate the effects of temperature changes on thermal stress in these devices. Three cases were studied in this project: (1) Investigation of thermal stress during thermal oxidation of silicon, (2) Investigation of thermally-induced crack propagation during die attach and (3) Popcorn cracking in plastic IC devices. Parametric analyses of the factors that may affect the reliability of the devices during these processing operations were performed using the commercial Finite Element software, Ansys. Results indicated that factors that can increase the magnitude of thermal stress during thermal oxidation include higher CTE mismatch and higher substrate thickness and modulus. In addition, a shorter crack length and lower CTE mismatch are some of the conditions that can lower the likelihood of crack propagation in a silicon die during the die attach operation. Finally, it was found out that a higher vapor pressure loading and crack length can increase the probability of popcorn cracking. The results in this study have indicated the importance of processing temperature, device geometry and material properties on the effect of thermal stress and crack propagation during processing. Hence, it is paramount for manufacturers to take these factors into consideration in order to improve the reliability of these devices.
author2 Xiao Zhongmin
author_facet Xiao Zhongmin
Fazrul Fazmi
format Final Year Project
author Fazrul Fazmi
author_sort Fazrul Fazmi
title Some thermal mismatch problems in electronic devices
title_short Some thermal mismatch problems in electronic devices
title_full Some thermal mismatch problems in electronic devices
title_fullStr Some thermal mismatch problems in electronic devices
title_full_unstemmed Some thermal mismatch problems in electronic devices
title_sort some thermal mismatch problems in electronic devices
publishDate 2009
url http://hdl.handle.net/10356/16614
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