Atomic layer deposition (ALD) of TiO2 films for photocatalytic application.

• المؤلف الرئيسي: Choudhury Anshuman Das.
• مؤلفون آخرون: Tan Thatt Yang Timothy
• التنسيق: Final Year Project
• اللغة: English
• منشور في: 2009
• الموضوعات: DRNTU::Engineering::Chemical engineering::Industrial photochemistry
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/16647

The field of photocatalysis can be traced back more than 80 years in history and during the past 20 years, it has become an extremely well researched field due to practical interest in air and water remediation, self-cleaning surfaces, and self-sterilizing surfaces. The following FYP project explore...