Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits

In this MSC dissertation, the focus of the study has been on the effect of critical parameters of rapid thermal anneal on shallow implants for ultra-shallow junction formation. Spike anneal was found to be more effective than soak anneal for ultra-shallow function formation.

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Bibliographic Details
Main Author:	Qin, Fei Tao
Other Authors:	Lau Wai Shing
Format:	Theses and Dissertations
Language:	English
Published:	2009
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
Online Access:	http://hdl.handle.net/10356/19276
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Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-19276
record_format	dspace
spelling	sg-ntu-dr.10356-192762023-07-04T15:38:35Z Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits Qin, Fei Tao Lau Wai Shing School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits In this MSC dissertation, the focus of the study has been on the effect of critical parameters of rapid thermal anneal on shallow implants for ultra-shallow junction formation. Spike anneal was found to be more effective than soak anneal for ultra-shallow function formation. Master of Science (Microelectronics) 2009-11-16T06:38:53Z 2009-11-16T06:38:53Z 2003 2003 Thesis http://hdl.handle.net/10356/19276 en 80 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits Qin, Fei Tao Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
description	In this MSC dissertation, the focus of the study has been on the effect of critical parameters of rapid thermal anneal on shallow implants for ultra-shallow junction formation. Spike anneal was found to be more effective than soak anneal for ultra-shallow function formation.
author2	Lau Wai Shing
author_facet	Lau Wai Shing Qin, Fei Tao
format	Theses and Dissertations
author	Qin, Fei Tao
author_sort	Qin, Fei Tao
title	Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
title_short	Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
title_full	Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
title_fullStr	Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
title_full_unstemmed	Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
title_sort	rapid thermal annealing for ultra-shallow junction in deep submicron cmos integrated circuits
publishDate	2009
url	http://hdl.handle.net/10356/19276
_version_	1772827619331407872

Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits

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