Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films

Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films

Various methods and apparatus have been developed for obtaining thin films or thin coatings. Films can be deposited by physical vapour deposition techniques and chemical vapour deposition techniques. Cathodic Vacuum Arc relates to the physical techniques, and which involves the use of positive ions...

Full description

Saved in:
Bibliographic Details
Main Author: Tay, Beng Kang
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:http://hdl.handle.net/10356/2743
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Description
Summary:Various methods and apparatus have been developed for obtaining thin films or thin coatings. Films can be deposited by physical vapour deposition techniques and chemical vapour deposition techniques. Cathodic Vacuum Arc relates to the physical techniques, and which involves the use of positive ions generated from a cathodic arc source. The cathodic arc is a form of electrical discharge in vacuum, which is sustained in plasma, created by the arc alone and does not require the addition of an inert gas.

Similar Items