Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films

Various methods and apparatus have been developed for obtaining thin films or thin coatings. Films can be deposited by physical vapour deposition techniques and chemical vapour deposition techniques. Cathodic Vacuum Arc relates to the physical techniques, and which involves the use of positive ions...

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Main Author:	Tay, Beng Kang
Other Authors:	School of Electrical and Electronic Engineering
Format:	Research Report
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:	http://hdl.handle.net/10356/2743
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-2743
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spelling	sg-ntu-dr.10356-27432023-03-04T03:21:32Z Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films Tay, Beng Kang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Various methods and apparatus have been developed for obtaining thin films or thin coatings. Films can be deposited by physical vapour deposition techniques and chemical vapour deposition techniques. Cathodic Vacuum Arc relates to the physical techniques, and which involves the use of positive ions generated from a cathodic arc source. The cathodic arc is a form of electrical discharge in vacuum, which is sustained in plasma, created by the arc alone and does not require the addition of an inert gas. 2008-09-17T09:14:06Z 2008-09-17T09:14:06Z 2001 2001 Research Report http://hdl.handle.net/10356/2743 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Tay, Beng Kang Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films
description	Various methods and apparatus have been developed for obtaining thin films or thin coatings. Films can be deposited by physical vapour deposition techniques and chemical vapour deposition techniques. Cathodic Vacuum Arc relates to the physical techniques, and which involves the use of positive ions generated from a cathodic arc source. The cathodic arc is a form of electrical discharge in vacuum, which is sustained in plasma, created by the arc alone and does not require the addition of an inert gas.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Tay, Beng Kang
format	Research Report
author	Tay, Beng Kang
author_sort	Tay, Beng Kang
title	Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films
title_short	Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films
title_full	Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films
title_fullStr	Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films
title_full_unstemmed	Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films
title_sort	design and fabrication of an improved filtered cathodic vacuum arc (fcva) deposition system for tetrahedral amorphous carbon (ta-c) films
publishDate	2008
url	http://hdl.handle.net/10356/2743
_version_	1759854888353792000

Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films

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